@article { , title = {193 nm ArF laser ablation and patterning of chitosan thin films}, abstract = {This paper reports laser ablation studies on spin coated bio polymer chitosan films, β-l,4-1inked 2-amino-2-deoxy-D-glucopyranose. Chitosan has been irradiated using an ArF laser emitting at 193 nm. An ablation threshold of FT = 858 mJcm-2 has been determined from etch rate measurements. Laser ablated chitosan is characterised using white light interferometry, scanning electron microscopy and thermo-gravimetric analysis. Laser ablation of chitosan is discussed in terms of thermal and photoacoustic mechanisms. Heat transfer is simulated to assist in the understanding of laser irradiated chitosan using a finite element method and the software package COMSOL Multi-Physics™. As a demonstrator, a micro-array of square structures in the form of a crossed grating has been fabricated by laser ablation using a mask projection scanning method. Initial investigations shown no evidence of thermal damage occurring to the adjacent chitosan when operating at a moderately low laser fluence of 110 mJcm-2.}, doi = {10.1007/s00339-018-1859-z}, eissn = {1432-0630}, issn = {0947-8396}, issue = {6}, publicationstatus = {Published}, publisher = {Springer Verlag}, url = {https://hull-repository.worktribe.com/output/738416}, volume = {124}, keyword = {Specialist Research - Other}, year = {2018}, author = {Aesa, A.A. and Walton, C.D.} }