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193 nm ArF laser ablation and patterning of chitosan thin films

Aesa, A. A.; Walton, C. D.


A. A. Aesa


This paper reports laser ablation studies on spin-coated biopolymer chitosan films, β-l,4-1inked 2-amino-2-deoxy-d-glucopyranose. Chitosan has been irradiated using an ArF laser emitting at 193 nm. An ablation threshold of FT = 85±8 mJ cm−2 has been determined from etch rate measurements. Laser-ablated chitosan is characterised using white light interferometry, scanning electron microscopy, and thermo-gravimetric analysis. Laser ablation of chitosan is discussed in terms of thermal and photoacoustic mechanisms. Heat transfer is simulated to assist in the understanding of laser-irradiated chitosan using a finite-element method and the software package COMSOL Multi-Physics™. As a demonstrator, a micro-array of square structures in the form of a crossed grating has been fabricated by laser ablation using a mask projection scanning method. The initial investigations show no evidence of thermal damage occurring to the adjacent chitosan when operating at a moderately low laser fluence of 110 mJ cm−2.

Journal Article Type Article
Publication Date 2018-06
Print ISSN 0340-3793
Peer Reviewed Peer Reviewed
Volume 124
Article Number 444
APA6 Citation Aesa, A. A., & Walton, C. D. (2018). 193 nm ArF laser ablation and patterning of chitosan thin films. Applied physics, 124,
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Copyright Statement
© The Author(s) 2018
Open Access
This article is distributed under the terms of the Creative Commons Attribution 4.0 International License (, which permits unrestricted use, distribution, and reproduction in any medium, provided you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made.

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