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193 nm ArF laser ablation and patterning of chitosan thin films (2018)
Journal Article
Aesa, A. A., & Walton, C. D. (2018). 193 nm ArF laser ablation and patterning of chitosan thin films. Applied physics, 124, https://doi.org/10.1007/s00339-018-1859-z

This paper reports laser ablation studies on spin-coated biopolymer chitosan films, β-l,4-1inked 2-amino-2-deoxy-d-glucopyranose. Chitosan has been irradiated using an ArF laser emitting at 193 nm. An ablation threshold of FT = 85±8 mJ cm−2 has been... Read More