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193 nm ArF laser ablation and patterning of chitosan thin films (2018)
Journal Article
Aesa, A., & Walton, C. (2018). 193 nm ArF laser ablation and patterning of chitosan thin films. Applied physics. A, Materials science & processing, 124(6), Article 444. https://doi.org/10.1007/s00339-018-1859-z

This paper reports laser ablation studies on spin coated bio polymer chitosan films, β-l,4-1inked 2-amino-2-deoxy-D-glucopyranose. Chitosan has been irradiated using an ArF laser emitting at 193 nm. An ablation threshold of FT = 858 mJcm-2 has been... Read More about 193 nm ArF laser ablation and patterning of chitosan thin films.