Electron hopping rate measurements in ITO junctions: charge diffusion in a layer-by-layer deposited ruthenium(II)-bis(benzimidazolyl)pyridine-phosphonate- TiO2 film
(2011)
Journal Article
Cummings, C. Y., Wadhawan, J. D., Nakabayashi, T., Haga, M. A., Rassaei, L., Dale, S. E., …Marken, F. (2011). Electron hopping rate measurements in ITO junctions: charge diffusion in a layer-by-layer deposited ruthenium(II)-bis(benzimidazolyl)pyridine-phosphonate- TiO2 film. Journal of Electroanalytical Chemistry, 657(1-2), 196-201. https://doi.org/10.1016/j.jelechem.2011.04.010
Focused ion beam (FIB) machining allowed a sub-micron trench to be cut through tin-doped indium oxide (ITO) film on glass to give a generator - collector junction electrode with narrow gap (ca. 600 nm). A layer-by-layer deposited film composed of a d... Read More about Electron hopping rate measurements in ITO junctions: charge diffusion in a layer-by-layer deposited ruthenium(II)-bis(benzimidazolyl)pyridine-phosphonate- TiO2 film.