Donatello Pagnotto
Stark Effect Control of the Scattering Properties of Plasmonic Nanogaps
Pagnotto, Donatello; Muravitskaya, Alina; Benoit, David M.; Bouillard, Jean Sebastien G.; Adawi, Ali M.
Authors
Alina Muravitskaya
Dr David Benoit D.Benoit@hull.ac.uk
Senior Lecturer in Molecular Physics and Astrochemistry
Dr Jean-Sebastien Bouillard J.Bouillard@hull.ac.uk
Senior Lecturer in Physics and Nanotechnology
Dr Ali Adawi A.Adawi@hull.ac.uk
Reader in Physics
Abstract
The development of actively tunable plasmonic nanostructures enables real-time and on-demand enhancement of optical signals. This is an essential requirement for a wide range of applications such as sensing and nanophotonic devices. Here we show that by modifying the transition energies of a material via the application of an electric field, the Stark effect offers practical approach to realise nano-scattering sources with high integration potential and a direct method to probe the excitonic properties of semiconducting materials on the nanoscale.
Citation
Pagnotto, D., Muravitskaya, A., Benoit, D. M., Bouillard, J. S. G., & Adawi, A. M. (2023). Stark Effect Control of the Scattering Properties of Plasmonic Nanogaps. ACS Applied Optical Materials, 1(1), 500–506. https://doi.org/10.1021/acsaom.2c00135
Journal Article Type | Article |
---|---|
Conference Name | International Conference on Metamaterials, Photonic Crystals and Plasmonics |
Acceptance Date | Dec 5, 2022 |
Online Publication Date | Dec 20, 2022 |
Publication Date | Jan 27, 2023 |
Deposit Date | Dec 15, 2022 |
Publicly Available Date | Dec 21, 2022 |
Journal | ACS Applied Optical Materials |
Electronic ISSN | 2771-9855 |
Publisher | American Chemical Society |
Peer Reviewed | Peer Reviewed |
Volume | 1 |
Issue | 1 |
Pages | 500–506 |
DOI | https://doi.org/10.1021/acsaom.2c00135 |
Keywords | Stark Effect; Plasmonic Nano-gap; Organic Semiconductor; FDTD; Molecular Polarizability; DFPT |
Public URL | https://hull-repository.worktribe.com/output/4154891 |
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Publisher Licence URL
http://creativecommons.org/licenses/by/4.0
Copyright Statement
© 2022 The Authors. Published by American Chemical Society
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