Hybrid FIB milling strategy for the fabrication of plasmonic nanostructures on semiconductor substrates
(2011)
Journal Article
Einsle, J. F., Bouillard, J. S., Dickson, W., & Zayats, A. V. (2011). Hybrid FIB milling strategy for the fabrication of plasmonic nanostructures on semiconductor substrates. Nanoscale Research Letters, 6(1), Article 572. https://doi.org/10.1186/1556-276X-6-572
The optical properties of plasmonic semiconductor devices fabricated by focused ion beam (FIB) milling deteriorate because of the amorphisation of the semiconductor substrate. This study explores the effects of combining traditional 30 kV FIB milling... Read More about Hybrid FIB milling strategy for the fabrication of plasmonic nanostructures on semiconductor substrates.