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Near-field investigation of porous silicon photoluminescence modification after oxidation in water

Juan, M.; Bouillard, J. S.; Plain, J.; Lerondel, G.; Adam, P. M.; Bachelot, R.; Royer, P.

Authors

M. Juan

J. Plain

G. Lerondel

P. M. Adam

R. Bachelot

P. Royer



Abstract

We report on local photo‐induced oxidation of porous silicon in water at room temperature. Starting from a nonluminescent sample, the oxidation process induces luminescence which was found to first increase and then decrease as a function of the oxidation time. A clear blue shift is also observed. This effect is believed to be owing to size modification of silicon nanocrystallites and thus is explained in terms of quantum confinement. Optical near‐field images and spectrum are used to monitor the photoluminescence modifications after oxidation. As the photoluminescence can be widely tuned in wavelength and intensity, this method offers a way to pattern the emission properties of the sample.

Citation

Juan, M., Bouillard, J. S., Plain, J., Lerondel, G., Adam, P. M., Bachelot, R., & Royer, P. (2008). Near-field investigation of porous silicon photoluminescence modification after oxidation in water. Journal of Microscopy, 229(3), 469-474. https://doi.org/10.1111/j.1365-2818.2008.01930.x

Journal Article Type Article
Acceptance Date Jun 16, 2007
Online Publication Date Mar 7, 2008
Publication Date 2008-03
Deposit Date May 6, 2020
Journal Journal of Microscopy
Print ISSN 0022-2720
Publisher Wiley
Peer Reviewed Peer Reviewed
Volume 229
Issue 3
Pages 469-474
DOI https://doi.org/10.1111/j.1365-2818.2008.01930.x
Keywords Oxidation; Porous silicon; SNOM
Public URL https://hull-repository.worktribe.com/output/1857254
Publisher URL https://onlinelibrary.wiley.com/doi/abs/10.1111/j.1365-2818.2008.01930.x