James W. Kingsley
Optical nanolithography using a scanning near-field probe with an integrated light source
Kingsley, James W.; Ray, Sumon K.; Adawi, Ali M.; Leggett, Graham J.; Lidzey, David G.
Authors
Abstract
An ultracompact near-field optical probe is described that is based on a single, integrated assembly consisting of a gallium nitride (GaN) light-emitting diode (LED), a microlens, and a cantilever assembly containing a hollow pyramidal probe with a subwavelength aperture at its apex. The LED emits ultraviolet light and may be used as a light source for near-field photolithographic exposure. Using this simple device compatible with many commercial atomic force microscope systems, it is possible to form nanostructures in photoresist with a resolution of 35 nm, corresponding to λ/10. © 2008 American Institute of Physics.
Citation
Kingsley, J. W., Ray, S. K., Adawi, A. M., Leggett, G. J., & Lidzey, D. G. (2008). Optical nanolithography using a scanning near-field probe with an integrated light source. Applied physics letters, 93(21), Article 213103. https://doi.org/10.1063/1.3032912
Journal Article Type | Article |
---|---|
Acceptance Date | Nov 1, 2008 |
Online Publication Date | Nov 24, 2008 |
Publication Date | Nov 24, 2008 |
Deposit Date | Nov 13, 2014 |
Publicly Available Date | Nov 13, 2014 |
Journal | Applied physics letters |
Print ISSN | 0003-6951 |
Electronic ISSN | 1077-3118 |
Publisher | American Institute of Physics |
Peer Reviewed | Peer Reviewed |
Volume | 93 |
Issue | 21 |
Article Number | 213103 |
DOI | https://doi.org/10.1063/1.3032912 |
Keywords | Cantilevers; Laser; Microlens arrays; Lithography; Microscopy; Fabrication; Nanostructures; Photolithography |
Public URL | https://hull-repository.worktribe.com/output/462774 |
Publisher URL | https://aip.scitation.org/doi/10.1063/1.3032912 |
Additional Information | Copy of article first published in Applied physics letters, v.93, issue 21 |
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