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Optical nanolithography using a scanning near-field probe with an integrated light source

Kingsley, James W.; Ray, Sumon K.; Adawi, Ali M.; Leggett, Graham J.; Lidzey, David G.

Authors

James W. Kingsley

Sumon K. Ray

Graham J. Leggett

David G. Lidzey



Abstract

An ultracompact near-field optical probe is described that is based on a single, integrated assembly consisting of a gallium nitride (GaN) light-emitting diode (LED), a microlens, and a cantilever assembly containing a hollow pyramidal probe with a subwavelength aperture at its apex. The LED emits ultraviolet light and may be used as a light source for near-field photolithographic exposure. Using this simple device compatible with many commercial atomic force microscope systems, it is possible to form nanostructures in photoresist with a resolution of 35 nm, corresponding to λ/10. © 2008 American Institute of Physics.

Citation

Kingsley, J. W., Ray, S. K., Adawi, A. M., Leggett, G. J., & Lidzey, D. G. (2008). Optical nanolithography using a scanning near-field probe with an integrated light source. Applied physics letters, 93(21), Article 213103. https://doi.org/10.1063/1.3032912

Journal Article Type Article
Acceptance Date Nov 1, 2008
Online Publication Date Nov 24, 2008
Publication Date Nov 24, 2008
Deposit Date Nov 13, 2014
Publicly Available Date Mar 28, 2024
Journal Applied physics letters
Print ISSN 0003-6951
Electronic ISSN 1077-3118
Publisher American Institute of Physics
Peer Reviewed Peer Reviewed
Volume 93
Issue 21
Article Number 213103
DOI https://doi.org/10.1063/1.3032912
Keywords Cantilevers; Laser; Microlens arrays; Lithography; Microscopy; Fabrication; Nanostructures; Photolithography
Public URL https://hull-repository.worktribe.com/output/462774
Publisher URL https://aip.scitation.org/doi/10.1063/1.3032912
Additional Information Copy of article first published in Applied physics letters, v.93, issue 21

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