Optical nanolithography using a scanning near-field probe with an integrated light source

Kingsley, James W.; Ray, Sumon K.; Adawi, Ali M.; Leggett, Graham J.; Lidzey, David G.

Abstract

An ultracompact near-field optical probe is described that is based on a single, integrated assembly consisting of a gallium nitride (GaN) light-emitting diode (LED), a microlens, and a cantilever assembly containing a hollow pyramidal probe with a subwavelength aperture at its apex. The LED emits ultraviolet light and may be used as a light source for near-field photolithographic exposure. Using this simple device compatible with many commercial atomic force microscope systems, it is possible to form nanostructures in photoresist with a resolution of 35 nm, corresponding to λ/10. © 2008 American Institute of Physics.

Citation

Kingsley, J. W., Ray, S. K., Adawi, A. M., Leggett, G. J., & Lidzey, D. G. (2008). Optical nanolithography using a scanning near-field probe with an integrated light source. Applied physics letters, 93(21), Article 213103. https://doi.org/10.1063/1.3032912

• Journal Article Type: Article
• Acceptance Date: Nov 1, 2008
• Online Publication Date: Nov 24, 2008
• Publication Date: Nov 24, 2008
• Deposit Date: Nov 13, 2014
• Publicly Available Date: Nov 13, 2014
• Journal: Applied physics letters
• Print ISSN: 0003-6951
• Electronic ISSN: 1077-3118
• Publisher: American Institute of Physics
• Peer Reviewed: Peer Reviewed
• Volume: 93
• Issue: 21
• Article Number: 213103
• DOI: https://doi.org/10.1063/1.3032912
• Keywords: Cantilevers; Laser; Microlens arrays; Lithography; Microscopy; Fabrication; Nanostructures; Photolithography
• Public URL: https://hull-repository.worktribe.com/output/462774
• Publisher URL: https://aip.scitation.org/doi/10.1063/1.3032912
• Additional Information: Copy of article first published in Applied physics letters, v.93, issue 21