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One-step photoembossing for submicrometer surface relief structures in liquid crystal semiconductors

O'Neill, Mary; Liedtke, Alicia; Lei, Chunhong; O’Neill, Mary; Dyer, Peter E.; Kitney, Stuart P.; Kelly, Stephen M.


Mary O'Neill

Alicia Liedtke

Chunhong Lei

Mary O’Neill

Peter E. Dyer

Stuart P. Kitney


We report a new single-step method to directly imprint nanometer-scale structures on photoreactive organic semiconductors. A surface relief grating is spontaneously formed when a light-emitting, liquid crystalline, and semiconducting thin film is irradiated by patterned light generated using a phase mask. Grating formation requires no postannealing nor wet etching so there is potential for high-throughput fabrication. The structured film is cross-linked for robustness. Gratings deeper than the original film thickness are made with periods as small as 265 nm. Grating formation is attributed to mass transfer, enhanced by self-assembly, from dark to illuminated regions. A photovoltaic device incorporating the grating is discussed.


Liedtke, A., Lei, C., O’Neill, M., Dyer, P. E., Kitney, S. P., & Kelly, S. M. (2010). One-step photoembossing for submicrometer surface relief structures in liquid crystal semiconductors. ACS Nano, 4(6), 3248-3253.

Journal Article Type Article
Acceptance Date Feb 1, 2010
Online Publication Date May 10, 2010
Publication Date Jun 22, 2010
Deposit Date Nov 13, 2014
Journal Acs Nano
Print ISSN 1936-0851
Electronic ISSN 1936-086X
Publisher American Chemical Society
Peer Reviewed Peer Reviewed
Volume 4
Issue 6
Pages 3248-3253
Keywords Liquid crystals; Molecular electronics; Nanoimprinting; Organic photovoltaics; Photolithography; Photonics; Self-assembly
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