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Embedding Reverse Electron Transfer Between Stably Bare Cu Nanoparticles and Cation-Vacancy CuWO4

Wang, Xiyang; Li, Zhen; Li, Xinbo; Gao, Chuan; Pu, Yinghui; Zhong, Xia; Qian, Jingyu; Zeng, Minli; Chu, Xuefeng; Chen, Zuolong; Redshaw, Carl; Zhou, Hua; Sun, Chengjun; Regier, Tom; King, Graham; Dynes, James J.; Zhang, Bingsen; Zhu, Yanqiu; Li, Guangshe; Peng, Yue; Wang, Nannan; Wu, Yimin A.

Authors

Xiyang Wang

Zhen Li

Xinbo Li

Chuan Gao

Yinghui Pu

Xia Zhong

Jingyu Qian

Minli Zeng

Xuefeng Chu

Zuolong Chen

Profile image of Carl Redshaw

Professor Carl Redshaw C.Redshaw@hull.ac.uk
Professor of Inorganic Materials Chemistry and REF Lead for Chemistry

Hua Zhou

Chengjun Sun

Tom Regier

Graham King

James J. Dynes

Bingsen Zhang

Yanqiu Zhu

Guangshe Li

Yue Peng

Nannan Wang

Yimin A. Wu



Abstract

Cu nanoparticles (NPs) have attracted widespread attention in electronics, energy, and catalysis. However, conventionally synthesized Cu NPs face some challenges such as surface passivation and agglomeration in applications, which impairs their functionalities in the physicochemical properties. Here, the issues above by engineering an embedded interface of stably bare Cu NPs on the cation-vacancy CuWO4 support is addressed, which induces the strong metal-support interactions and reverse electron transfer. Various atomic-scale analyses directly demonstrate the unique electronic structure of the embedded Cu NPs with negative charge and anion oxygen protective layer, which mitigates the typical degradation pathways such as oxidation in ambient air, high-temperature agglomeration, and CO poisoning adsorption. Kinetics and in situ spectroscopic studies unveil that the embedded electron-enriched Cu NPs follow the typical Eley-Rideal mechanism in CO oxidation, contrasting the Langmuir-Hinshelwood mechanism on the traditional Cu NPs. This mechanistic shift is driven by the Coulombic repulsion in anion oxygen layer, enabling its direct reaction with gaseous CO to form the easily desorbed monodentate carbonate.

Citation

Wang, X., Li, Z., Li, X., Gao, C., Pu, Y., Zhong, X., Qian, J., Zeng, M., Chu, X., Chen, Z., Redshaw, C., Zhou, H., Sun, C., Regier, T., King, G., Dynes, J. J., Zhang, B., Zhu, Y., Li, G., Peng, Y., …Wu, Y. A. (online). Embedding Reverse Electron Transfer Between Stably Bare Cu Nanoparticles and Cation-Vacancy CuWO4. Advanced materials, https://doi.org/10.1002/adma.202412570

Journal Article Type Article
Acceptance Date Oct 10, 2024
Online Publication Date Oct 14, 2024
Deposit Date Oct 26, 2024
Publicly Available Date Oct 28, 2024
Journal Advanced Materials
Print ISSN 0935-9648
Publisher Wiley
Peer Reviewed Peer Reviewed
DOI https://doi.org/10.1002/adma.202412570
Keywords Cu nanoparticles; In situ spectroscopies; Metal-support interactions; Reverse electron transfer; Strong embedded interface
Public URL https://hull-repository.worktribe.com/output/4871514

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Publisher Licence URL
https://creativecommons.org/licenses/by-nc-nd/4.0/

Copyright Statement
© 2024 UChicago Argonne, LLC and The Author(s). Advanced Materials published by Wiley-VCH GmbH
This is an open access article under the terms of the Creative Commons Attribution-NonCommercial-NoDerivs License, which permits use and distribution in any medium, provided the original work is properly cited, the use is non-commercial and no modifications or adaptations are made.




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