A.A. Aesa
193 nm ArF laser ablation and patterning of chitosan thin films
Aesa, A.A.; Walton, C.D.
Authors
C.D. Walton
Abstract
This paper reports laser ablation studies on spin coated bio polymer chitosan films, β-l,4-1inked 2-amino-2-deoxy-D-glucopyranose. Chitosan has been irradiated using an ArF laser emitting at 193 nm. An ablation threshold of FT = 858 mJcm-2 has been determined from etch rate measurements. Laser ablated chitosan is characterised using white light interferometry, scanning electron microscopy and thermo-gravimetric analysis. Laser ablation of chitosan is discussed in terms of thermal and photoacoustic mechanisms. Heat transfer is simulated to assist in the understanding of laser irradiated chitosan using a finite element method and the software package COMSOL Multi-Physics™. As a demonstrator, a micro-array of square structures in the form of a crossed grating has been fabricated by laser ablation using a mask projection scanning method. Initial investigations shown no evidence of thermal damage occurring to the adjacent chitosan when operating at a moderately low laser fluence of 110 mJcm-2.
Citation
Aesa, A., & Walton, C. (2018). 193 nm ArF laser ablation and patterning of chitosan thin films. Applied physics. A, Materials science & processing, 124(6), Article 444. https://doi.org/10.1007/s00339-018-1859-z
Journal Article Type | Article |
---|---|
Acceptance Date | May 15, 2018 |
Online Publication Date | May 23, 2018 |
Publication Date | Jun 1, 2018 |
Deposit Date | Jun 28, 2018 |
Publicly Available Date | Jun 29, 2018 |
Print ISSN | 0947-8396 |
Electronic ISSN | 1432-0630 |
Publisher | Springer Verlag |
Peer Reviewed | Peer Reviewed |
Volume | 124 |
Issue | 6 |
Article Number | 444 |
DOI | https://doi.org/10.1007/s00339-018-1859-z |
Public URL | https://hull-repository.worktribe.com/output/738416 |
Publisher URL | https://link.springer.com/article/10.1007%2Fs00339-018-1859-z |
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This article is distributed under the terms of the Creative Commons Attribution 4.0 International License (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted use, distribution, and reproduction in any medium, provided you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made.
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