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193 nm ArF laser ablation and patterning of chitosan thin films

Aesa, A.A.; Walton, C.D.


A.A. Aesa

C.D. Walton


This paper reports laser ablation studies on spin coated bio polymer chitosan films, β-l,4-1inked 2-amino-2-deoxy-D-glucopyranose. Chitosan has been irradiated using an ArF laser emitting at 193 nm. An ablation threshold of FT = 858 mJcm-2 has been determined from etch rate measurements. Laser ablated chitosan is characterised using white light interferometry, scanning electron microscopy and thermo-gravimetric analysis. Laser ablation of chitosan is discussed in terms of thermal and photoacoustic mechanisms. Heat transfer is simulated to assist in the understanding of laser irradiated chitosan using a finite element method and the software package COMSOL Multi-Physics™. As a demonstrator, a micro-array of square structures in the form of a crossed grating has been fabricated by laser ablation using a mask projection scanning method. Initial investigations shown no evidence of thermal damage occurring to the adjacent chitosan when operating at a moderately low laser fluence of 110 mJcm-2.


Aesa, A., & Walton, C. (2018). 193 nm ArF laser ablation and patterning of chitosan thin films. Applied physics. A, Materials science & processing, 124(6), Article 444.

Journal Article Type Article
Acceptance Date May 15, 2018
Online Publication Date May 23, 2018
Publication Date Jun 1, 2018
Deposit Date Jun 28, 2018
Publicly Available Date Jun 29, 2018
Print ISSN 0947-8396
Electronic ISSN 1432-0630
Publisher Springer Verlag
Peer Reviewed Peer Reviewed
Volume 124
Issue 6
Article Number 444
Public URL
Publisher URL


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This article is distributed under the terms of the Creative Commons Attribution 4.0 International License (, which permits unrestricted use, distribution, and reproduction in any medium, provided you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made.

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