193 nm ArF laser ablation and patterning of chitosan thin films
Aesa, A.A.; Walton, C.D.
Dr Chris Walton C.D.Walton@hull.ac.uk
This paper reports laser ablation studies on spin coated bio polymer chitosan films, β-l,4-1inked 2-amino-2-deoxy-D-glucopyranose. Chitosan has been irradiated using an ArF laser emitting at 193 nm. An ablation threshold of FT = 858 mJcm-2 has been determined from etch rate measurements. Laser ablated chitosan is characterised using white light interferometry, scanning electron microscopy and thermo-gravimetric analysis. Laser ablation of chitosan is discussed in terms of thermal and photoacoustic mechanisms. Heat transfer is simulated to assist in the understanding of laser irradiated chitosan using a finite element method and the software package COMSOL Multi-Physics™. As a demonstrator, a micro-array of square structures in the form of a crossed grating has been fabricated by laser ablation using a mask projection scanning method. Initial investigations shown no evidence of thermal damage occurring to the adjacent chitosan when operating at a moderately low laser fluence of 110 mJcm-2.
Aesa, A., & Walton, C. (2018). 193 nm ArF laser ablation and patterning of chitosan thin films. Applied physics. A, Materials science & processing, 124(6), https://doi.org/10.1007/s00339-018-1859-z
|Journal Article Type||Article|
|Acceptance Date||May 15, 2018|
|Online Publication Date||May 23, 2018|
|Publication Date||Jun 1, 2018|
|Deposit Date||Jun 28, 2018|
|Publicly Available Date||Jun 29, 2018|
|Peer Reviewed||Peer Reviewed|
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