193 nm ArF laser ablation and patterning of chitosan thin films

Aesa, A.A.; Walton, C.D.

Abstract

This paper reports laser ablation studies on spin coated bio polymer chitosan films, β-l,4-1inked 2-amino-2-deoxy-D-glucopyranose. Chitosan has been irradiated using an ArF laser emitting at 193 nm. An ablation threshold of FT = 858 mJcm-2 has been determined from etch rate measurements. Laser ablated chitosan is characterised using white light interferometry, scanning electron microscopy and thermo-gravimetric analysis. Laser ablation of chitosan is discussed in terms of thermal and photoacoustic mechanisms. Heat transfer is simulated to assist in the understanding of laser irradiated chitosan using a finite element method and the software package COMSOL Multi-Physics™. As a demonstrator, a micro-array of square structures in the form of a crossed grating has been fabricated by laser ablation using a mask projection scanning method. Initial investigations shown no evidence of thermal damage occurring to the adjacent chitosan when operating at a moderately low laser fluence of 110 mJcm-2.

Citation

Aesa, A., & Walton, C. (2018). 193 nm ArF laser ablation and patterning of chitosan thin films. Applied physics. A, Materials science & processing, 124(6), Article 444. https://doi.org/10.1007/s00339-018-1859-z

• Journal Article Type: Article
• Acceptance Date: May 15, 2018
• Online Publication Date: May 23, 2018
• Publication Date: Jun 1, 2018
• Deposit Date: Jun 28, 2018
• Publicly Available Date: Jun 29, 2018
• Print ISSN: 0947-8396
• Publisher: Springer Verlag
• Peer Reviewed: Peer Reviewed
• Volume: 124
• Issue: 6
• Article Number: 444
• DOI: https://doi.org/10.1007/s00339-018-1859-z
• Public URL: https://hull-repository.worktribe.com/output/738416
• Publisher URL: https://link.springer.com/article/10.1007%2Fs00339-018-1859-z
• Contract Date: Jun 28, 2018