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Enhanced chemical etch rate of borosilicate glass via spatially resolved laser-generated color centers

Serkov, A. A.; Snelling, H. V.


A. A. Serkov


© 2020 IOP Publishing Ltd. In this work, it is shown that controllable increases in chemical reactivity of borosilicate glass can be induced through spatially resolved femtosecond laser irradiation at fluence values significantly lower than the damage threshold. The hydrofluoric acid etch rate has been found to be closely correlated to the reduction in optical transmission of the glass at 488 nm, which is, in turn, governed by the production of boron-oxygen hole centers. The combination of laser irradiation below the ablation threshold followed by chemical etching is shown to yield surfaces that have a roughness lower than those achieved by either laser or chemical etching alone. Application of this effect to the manufacture of freeform Laplacian optics is demonstrated.


Serkov, A. A., & Snelling, H. V. (2020). Enhanced chemical etch rate of borosilicate glass via spatially resolved laser-generated color centers. Journal of Physics D: Applied Physics, 53(13), Article 135306.

Journal Article Type Article
Acceptance Date Dec 23, 2019
Online Publication Date Dec 23, 2019
Publication Date Jan 22, 2020
Deposit Date Feb 11, 2020
Publicly Available Date Oct 27, 2022
Journal Journal of Physics D: Applied Physics
Print ISSN 0022-3727
Electronic ISSN 1361-6463
Publisher IOP Publishing
Peer Reviewed Peer Reviewed
Volume 53
Issue 13
Article Number 135306
Keywords Acoustics and Ultrasonics; Electronic, Optical and Magnetic Materials; Surfaces, Coatings and Films; Condensed Matter Physics
Public URL


Accepted manuscript (931 Kb)

Copyright Statement
This Accepted Manuscript is © 2019 IOP Publishing Ltd.
This Accepted Manuscript is available for reuse under a CC BY-NC-ND 3.0 licence after the 12 month embargo period.

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