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Electron hopping rate measurements in ITO junctions: charge diffusion in a layer-by-layer deposited ruthenium(II)-bis(benzimidazolyl)pyridine-phosphonate- TiO2 film

Dale, Sara E C; Haga, Masa-aki; Dale, Sara E. C.; Wadhawan, Jay; Cummings, Charles Y.; Wadhawan, Jay D.; Nakabayashi, Takuya; Haga, Masa Aki; Rassaei, Liza; Dale, Sara E.C.; Bending, Simon; Pumera, Martin; Parker, Stephen C.; Marken, Frank

Authors

Sara E C Dale

Masa-aki Haga

Sara E. C. Dale

Charles Y. Cummings

Takuya Nakabayashi

Masa Aki Haga

Liza Rassaei

Sara E.C. Dale

Simon Bending

Martin Pumera

Stephen C. Parker

Frank Marken



Abstract

Focused ion beam (FIB) machining allowed a sub-micron trench to be cut through tin-doped indium oxide (ITO) film on glass to give a generator - collector junction electrode with narrow gap (ca. 600 nm). A layer-by-layer deposited film composed of a dinuclear ruthenium(II)-bis(benzimidazolyl) pyridine-phosphonate (as the negative component) and nanoparticulate TiO2 (ca. 6 nm diameter, as the positive component) was formed and investigated first on simple ITO electrodes and then on ITO junction electrodes. The charge transport within this film due to Ru(II/III) redox switching (electron hopping) was investigated and an apparent diffusion coefficient of ca. Dapp = 2 (} 1) 1015 m2 s1 was observed with minimal contributions from intra-molecular Ru-Ru interactions. The benefits of FIB-cut ITO junctions as a tool in determining charge hopping rates are highlighted.

Citation

Cummings, C. Y., Wadhawan, J. D., Nakabayashi, T., Haga, M. A., Rassaei, L., Dale, S. E., Bending, S., Pumera, M., Parker, S. C., & Marken, F. (2011). Electron hopping rate measurements in ITO junctions: charge diffusion in a layer-by-layer deposited ruthenium(II)-bis(benzimidazolyl)pyridine-phosphonate- TiO2 film. Journal of Electroanalytical Chemistry, 657(1-2), 196-201. https://doi.org/10.1016/j.jelechem.2011.04.010

Journal Article Type Article
Acceptance Date Apr 15, 2011
Online Publication Date Apr 22, 2011
Publication Date Jul 1, 2011
Journal JOURNAL OF ELECTROANALYTICAL CHEMISTRY
Print ISSN 1572-6657
Publisher Elsevier
Peer Reviewed Peer Reviewed
Volume 657
Issue 1-2
Pages 196-201
DOI https://doi.org/10.1016/j.jelechem.2011.04.010
Keywords Voltammetry; Layer-by-layer assembly; Electron hopping; Diffusion; Focused ion beam; Sensor
Public URL https://hull-repository.worktribe.com/output/400072
Publisher URL https://www.sciencedirect.com/science/article/pii/S1572665711001986?via%3Dihub