Sara E C Dale
Electron hopping rate measurements in ITO junctions: charge diffusion in a layer-by-layer deposited ruthenium(II)-bis(benzimidazolyl)pyridine-phosphonate- TiO2 film
Dale, Sara E C; Haga, Masa-aki; Dale, Sara E. C.; Wadhawan, Jay; Cummings, Charles Y.; Wadhawan, Jay D.; Nakabayashi, Takuya; Haga, Masa Aki; Rassaei, Liza; Dale, Sara E.C.; Bending, Simon; Pumera, Martin; Parker, Stephen C.; Marken, Frank
Authors
Masa-aki Haga
Sara E. C. Dale
Professor Jay Wadhawan J.Wadhawan@hull.ac.uk
Professor
Charles Y. Cummings
Professor Jay Wadhawan J.Wadhawan@hull.ac.uk
Professor
Takuya Nakabayashi
Masa Aki Haga
Liza Rassaei
Sara E.C. Dale
Simon Bending
Martin Pumera
Stephen C. Parker
Frank Marken
Abstract
Focused ion beam (FIB) machining allowed a sub-micron trench to be cut through tin-doped indium oxide (ITO) film on glass to give a generator - collector junction electrode with narrow gap (ca. 600 nm). A layer-by-layer deposited film composed of a dinuclear ruthenium(II)-bis(benzimidazolyl) pyridine-phosphonate (as the negative component) and nanoparticulate TiO2 (ca. 6 nm diameter, as the positive component) was formed and investigated first on simple ITO electrodes and then on ITO junction electrodes. The charge transport within this film due to Ru(II/III) redox switching (electron hopping) was investigated and an apparent diffusion coefficient of ca. Dapp = 2 (} 1) 1015 m2 s1 was observed with minimal contributions from intra-molecular Ru-Ru interactions. The benefits of FIB-cut ITO junctions as a tool in determining charge hopping rates are highlighted.
Citation
Cummings, C. Y., Wadhawan, J. D., Nakabayashi, T., Haga, M. A., Rassaei, L., Dale, S. E., Bending, S., Pumera, M., Parker, S. C., & Marken, F. (2011). Electron hopping rate measurements in ITO junctions: charge diffusion in a layer-by-layer deposited ruthenium(II)-bis(benzimidazolyl)pyridine-phosphonate- TiO2 film. Journal of Electroanalytical Chemistry, 657(1-2), 196-201. https://doi.org/10.1016/j.jelechem.2011.04.010
Journal Article Type | Article |
---|---|
Acceptance Date | Apr 15, 2011 |
Online Publication Date | Apr 22, 2011 |
Publication Date | Jul 1, 2011 |
Journal | JOURNAL OF ELECTROANALYTICAL CHEMISTRY |
Print ISSN | 1572-6657 |
Publisher | Elsevier |
Peer Reviewed | Peer Reviewed |
Volume | 657 |
Issue | 1-2 |
Pages | 196-201 |
DOI | https://doi.org/10.1016/j.jelechem.2011.04.010 |
Keywords | Voltammetry; Layer-by-layer assembly; Electron hopping; Diffusion; Focused ion beam; Sensor |
Public URL | https://hull-repository.worktribe.com/output/400072 |
Publisher URL | https://www.sciencedirect.com/science/article/pii/S1572665711001986?via%3Dihub |
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