Electron hopping rate measurements in ITO junctions: charge diffusion in a layer-by-layer deposited ruthenium(II)-bis(benzimidazolyl)pyridine-phosphonate- TiO2 film
(2011)
Journal Article
Cummings, C. Y., Wadhawan, J. D., Nakabayashi, T., Haga, M. A., Rassaei, L., Dale, S. E., Bending, S., Pumera, M., Parker, S. C., & Marken, F. (2011). Electron hopping rate measurements in ITO junctions: charge diffusion in a layer-by-layer deposited ruthenium(II)-bis(benzimidazolyl)pyridine-phosphonate- TiO2 film. Journal of Electroanalytical Chemistry, 657(1-2), 196-201. https://doi.org/10.1016/j.jelechem.2011.04.010
Focused ion beam (FIB) machining allowed a sub-micron trench to be cut through tin-doped indium oxide (ITO) film on glass to give a generator - collector junction electrode with narrow gap (ca. 600 nm). A layer-by-layer deposited film composed of a d... Read More about Electron hopping rate measurements in ITO junctions: charge diffusion in a layer-by-layer deposited ruthenium(II)-bis(benzimidazolyl)pyridine-phosphonate- TiO2 film.